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CommVault to exhibit latest data management solutions at GITEX 2011

CommVault Systems, a supplier of data management software solutions, has announced that it will be exhibiting at Gitex Technology Week 2011 and demonstrating its revolutionary Simpana software.

Colin Summers, regional director at CommVault said, “GITEX is the premier IT event in the calendar for the Middle East. It is a ‘once a year’ opportunity to get access to thousands of potential new customers and partners. CommVault is undergoing a massive investment within this region and the exhibition synergises with our own growth plans in the Gulf, Levant and Saudi Arabia markets”.

“We are looking to develop new relationships within the IT channel and vendor communities as well as raise the profile of CommVault and Simpana within the enterprise end-user group. We expect to achieve these objectives through our particiipation at the event,” Summers said.

CommVault’s mulit-award winning software Simpana helps enterprises manage data growth, cut costs and reduce risk by simplifying data management functions and embodies a policy-driven approach to solving real-world IT challenges, representatives said.

Cisco said that Simpana is a unified software platform, which manages critical functions such as back up, deduplication, disaster recovery, archiving and management of information.

In parallel CommVault provides professional services such as project management, training, support and on-site installation and implementation services to augment the Simpana software, the company said.

According to CommVault, it is the industry’s only software company exclusively focused on modernising data and information management, CommVault alleviates the problems caused by competitive point products by offering a unique, single view of all enterprise information, regardless of where it resides.

GITEX Technology Week takes place at the Dubai International Convention and Exhibition Centre (DICEC) between 9-13 October 2011. CommVault can be found in Hall 2 at stand number H2-2.

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